by paliardp | Nov 7, 2016 | Applications
Ion beam sputter deposition Adding a thin film In ion beam sputter deposition the goal is to add a thin film to the substrate surface to change its material properties. The concept of ion beam deposition is an ion beam that sputters a target in proximity to the...
by paliardp | Oct 7, 2016 | Applications
Ion implantation Compositional and structural change The goal of ion implantation is to add ions to the interior of a substrate to change its material properties. The incoming ions change the elemental composition, but they also induce a structural change because they...
by paliardp | Sep 7, 2016 | Applications
Ion beam figuring (IBF) An eraser tool for surface errors In ion beam figuring the goal is to create, by locally sputtering atoms, a surface with a specified profile. It is a technique that can be used for precise figuring and finishing of optical elements, such as...
by paliardp | Aug 15, 2016 | Applications
From sputter cleaning to ion milling: ion beam sputtering Sputter cleaning, ion polishing, ion milling, ion cutting, all are based on ion beam sputtering. Ion beam sputtering with noble gas ions is a physical technique to remove surface layers. Ions are directed at...
by paliardp | Jul 27, 2016 | Applications
Ion assisted deposition Improving thin film properties during deposition In ion assisted deposition the goal is to modify the properties of a growing thin film by directing an ion beam at it. Ion assistance is often used in combination with thin film deposition by...
by paliardp | Jun 7, 2016 | Applications
Nuclear and atomic physics Originally developed as a simple, miniature, and low power particle source for accelerators, our ECR ion sources have found their way into various atomic and nuclear physics applications. Gas ionization chamber for mass spectrometry To...
