TES | Ion mill
For other surface processing applications, please look at our other TES and HEXAR sources and our IE-gun. Don’t hesitate to contact us with your specific need. Our custom beam solutions page gives several examples of the possibilities.
The core element of TES is a patented microwave discharge system (ECR-plasma) that operates at ultralow power and is as small as a thumb. You can find more about the technology here. The extraction system connected to the cavity determines the nature of the particles that leave the source. TES Ion mill is configured with an Einzel lens to produce focused beams on the sample with high current density. The ion current can be varied over a wide range by tuning the gas flow rate, the applied microwave power, and the strength of the extraction field, independently from the beam energy. Through closed loop regulation of the UHF power the beam current can be made extremely stable.
Source coupling to the flange: rigid or flexible
- Plug & play (no microwave tuning)
- no cooling
- noble and reactive gases
- variable spotsize (from sub-mm to cms)
- automated source operation
- closed loop current regulation
Ion beam sputtering of insulating materials can cause undesirable charging effects. An electron source can compensate these charges. Polygon Physics offers an ECR-plasma based neutralizer which has the same core element TES sources have. This type of neutralizer is inherently stable, and has a long lifetime due to the absence of any consumables such as filaments. Contact us if this could be of interest to you.
The source comes with a user-friendly control & monitoring interface, that allows you to control the beam, record data, and run stored recipes. Labview drivers are available to integrate our software with other systems.
TES Ion mill comes equipped with an Einzel module, to focus the ion beam at the sample. Due to this module the diameter of the beam that hits the surface can be squeezed to sub mm dimensions. This in combination with a high beam current, and beam energy up to 10keV, ensures high local milling rates. For more gentle milling the beam energy can be reduced. The UHF power required for operation is at most 5W, for a maximum beam current of more than 500µA. The gas flow (typically a few sccm) can be regulated with either a mass flow controller or a leak valve. TES Ion mill can be mounted directly on a KF or CF 40 flange, or indirectly, via flexible cables only. Due to the absence of grids and filaments, the beam is stable and reliable, and maintenance is low.
The source module is delivered with 19¨ rack-mount electronics, SMA and HV cables, power cord and USB software. Not included are the source gas and pc. TES can be customized to match your specific application. Contact us for the possibilities and/or check our page on custom beam solutions.