TES | High brightness ion source

Apr 15, 2019 | Products

photo of TES High brightness ion source on CF63 (vacuum side visible)

Polygon Physics’ TES High Brightness ion source is mainly developed as injection source for optical systems of FIBs, accelerators, and surface analysis equipment. Directly mounted on a grounded Ø63mm CF or KF flange, this source generates parallel ion beams of up to ±30keV.

For higher energy beams we offer IE gun. For lower energy surface processing applications, please look at our other TES and HEXAR sources. Don’t hesitate to contact us with your specific need. Our custom beam solutions page gives several examples of the possibilities.

Source concept

The core element of TES is a patented microwave discharge system (ECR-plasma) that operates at ultralow power and is as small as a thumb. You can find more about the technology here. The extraction system connected to the cavity determines the nature of the particles that leave the source. In high brightness mode TES is configured with aperture lenses to produce parallel beams of positive or negative ions. The ion current can be varied over a wide range by tuning the gas flow rate, the applied microwave power, and the strength of the extraction field, independently from the beam energy. Through closed loop regulation of the UHF power the beam current can be made extremely stable.

Main features

  • Plug & play (no microwave tuning)
  • filamentless
  • no cooling
  • noble and reactive gases
  • bipolar operation
  • UHV-compatible
  • automated source operation
  • closed loop current regulation


Photos of four different parallel beams: positive beams of xenon, argon, and oxygen, and a negative oxygen beam (including deflected electron beam)


The source comes with a user-friendly control & monitoring interface, that allows you to control the beam, record data, and run stored recipes. Labview drivers are available to integrate our software with other systems.

Screenshot of the user interface of the ion source control system for TES

Technical data

TES high brightness ion source comes equipped with a small extraction aperture to deliver beam currents up to 12 µA (Ar+), using an UHF power of up to 5W. The gas flow can be regulated with either a mass flow controller or a leak valve. TES High brightness ion source is mounted directly on a KF or CF 63 flange for beam energies up to 30keV. For beam energies up to 10keV TES High brightness ion source can also be mounted on CF 40.

The source module is delivered with 19¨ rack-mount electronics, SMA and HV cables, power cord and USB software. Not included are the source gas and pc. TES can be customized to match your specific application. Contact us for the possibilities and/or check our page on custom beam solutions.

Schematic diagram of TES-63 High brightness ion source, with dimensions

La conception de TES est cofinancée par l’Union européenne. L’Europe s’engage en Auvergne-Rhône-Alpes avec le Fonds européen de développement régional.