TES | Single-cavity ECR-plasma based sources
TES is a family of ion sources, electron sources, plasma sources, and atom sources, based on patented mono-cavity ECR technology.
Starting from the same core element a wide variety of sources can be built, ranging from a focused beam source for ion milling and ion beam figuring, to a high brightness ion source to inject into focusing columns of FIB and for surface analysis systems, to a UHV-compatible atomic oxygen source, to a simple plasma source or sputter source for surface cleaning and/or ion beam sputter deposition. Contact us for more information.
Each of these sources can be mounted with either a rigid or flexible flange coupling, allowing for source movements under vacuum.
Exploiting the ECR plasma itself, this source is designed for downstream plasma cleaning / remote source plasma cleaning.
A source type suitable for surface treatments such as carbon cleaning, oxidation, and nitride formation with very low damage. The atom beam is created by filtering the charged particles from the plasma.
Long-lifetime ECR-based neutralizers or electron flood guns, developed for beam/surface neutralization, but also electron sources for higher beam energies.
Source coupling to the flange: rigid or flexible
Sources from the TES family can be either directly mounted onto a flange with rigid coupling, but can also be coupled to the flange through flexible connectors only, allowing you to position the source inside your system wherever you want.
The source comes with a user-friendly control & monitoring interface, that allows you to control the beam, record data, and run stored recipes. Labview drivers are available to integrate our software with other systems.
Due the different possible extraction systems as well as the customizable beam optics, TES is truly a multipurpose source concept. It can be configured for different applications that include ion beam figuring, ion milling, sputter cleaning, surface modification, neutralization, assistance for thin film deposition, and ion beam sputter deposition. You can find more information about these applications on this page.
La conception de TES est cofinancée par l’Union européenne. L’Europe s’engage en Auvergne-Rhône-Alpes avec le Fonds européen de développement régional.